TEM Gemini Ontology (TEMGO)
type: Ontology
version IRI: 0.2.0-beta
imports: temgo-dependencies.ttl
abstract: The TEM Gemini Ontology (TEMGO) provides a standardised taxonomy and vocabulary for TEM and SEM characterisation procedures, workflows, instruments and tools used within the TEM Gemini Centre.
contributor: physmet
created: 2025-05-09
creator: https://orcid.org/0000-0001-5142-2199
creator: Jesper Friis
creator: Tor Strømsem Haugland
creator: Sigurd Wenner
creator: Inga D. Konow
description: An EMMO-based application-level ontology that defines standardised TEM and SEM characterisation procedures, workflows, instruments and tools used within the TEM Gemini Centre.
license: https://creativecommons.org/licenses/by/4.0/legalcode
publisher: TEM Gemini Centre
doi: temgo#
status: UnderDevelopment
preferred namespace prefix: temgo
label: TEMGO
prior version: 0.1.0
version info: 0.2.0-beta
funded by: he-matchmaker.eu
funded by: www.forskningsradet.no

relatedTechnique
type: AnnotationProperty
description: Relates a property to a characterisation technique that this property is relevant for.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Relates a property to a characterisation technique that this property is relevant for.
range: CharacterisationTechnique
domain: Property

instrument
type: ObjectProperty
domain: Resource
range: Instrument
description: Reference to the instrument
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Reference to the instrument

sampleHolder
type: ObjectProperty
domain: Instrument
range: SampleHolder
description: Reference to sample holder.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Reference to sample holder.
relatedTechnique: TransmissionElectronMicroscopy

studiedBy
type: ObjectProperty
description: The Agent who studied the documented object.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: The Agent who studied the documented object.

accelerationVoltage
type: DatatypeProperty
domain: Instrument
range: double
description: Electron acceleration voltage
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Electron acceleration voltage
unit: V

apertureDiameterObjective
type: DatatypeProperty
domain: Instrument
range: double
description: Diameter of objective aperture
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Diameter of objective aperture
unit: m

beamCurrent
type: DatatypeProperty
domain: Instrument
range: double
description: Current of the electron beam
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Current of the electron beam
unit: A
relatedTechnique: ScanningElectronMicroscopy

dateOfReceival
type: DatatypeProperty
sub property of: topDataProperty
range: date
description: The date an object is received.
alternative label: receivedDate
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: The date an object is received.

detectorMode
type: DatatypeProperty
domain: Instrument
range: string
description: Detecor's mode, e.g., SE
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Detecor's mode, e.g., SE

detectorName
type: DatatypeProperty
domain: Instrument
range: string
description: Detecor's name, e.g., ETD
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Detecor's name, e.g., ETD

dwellTime
type: DatatypeProperty
domain: Instrument
range: double
description: Beam dwell time on each pixel during scan.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Beam dwell time on each pixel during scan.
unit: s
relatedTechnique: ScanningElectronMicroscopy
relatedTechnique: STEM

electronSource
type: DatatypeProperty
domain: Instrument
range: string
description: Electron source, e.g., FEG
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Electron source, e.g., FEG

lineIntegration
type: DatatypeProperty
domain: Instrument
range: integer
description: Number of times each line was scanned for intensity integration.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Number of times each line was scanned for intensity integration.
relatedTechnique: ScanningElectronMicroscopy
relatedTechnique: STEM

magnification
type: DatatypeProperty
domain: Instrument
range: double
description: Magnification
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Magnification

PositionX
type: DatatypeProperty
domain: Instrument
range: double
description: X position of the stage/specimen relative to origin
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: X position of the stage/specimen relative to origin
unit: m

PositionY
type: DatatypeProperty
domain: Instrument
range: double
description: Y position of the stage/specimen relative to origin
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Y position of the stage/specimen relative to origin
unit: m

PositionZ
type: DatatypeProperty
domain: Instrument
range: double
description: Z position of the stage/specimen relative to origin
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Z position of the stage/specimen relative to origin
unit: m

stageRotation
type: DatatypeProperty
domain: Instrument
range: double
description: In-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: In-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
unit: degree
relatedTechnique: ScanningElectronMicroscopy

stageRotationMax
type: DatatypeProperty
domain: Instrument
range: double
description: Maximum in-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Maximum in-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
unit: degree
relatedTechnique: ScanningElectronMicroscopy

stageRotationMin
type: DatatypeProperty
domain: Instrument
range: double
description: Minimum in-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Minimum in-plane rotation of the SEM sample stage about the beam relative to the chamber X-axis. Positive rotation is clockwise.
unit: degree
relatedTechnique: ScanningElectronMicroscopy

TiltX
type: DatatypeProperty
domain: Instrument
range: double
description: Tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
unit: degree

TiltXMax
type: DatatypeProperty
domain: Instrument
range: double
description: Maximum tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Maximum tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
unit: degree

TiltXMin
type: DatatypeProperty
domain: Instrument
range: double
description: Minimum tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Minimum tilt of the stage (SEM) or specimen holder (TEM) about the X-axis. For SEM, the X-axis is defined in the chamber coordinate system (left-right). For TEM, this corresponds to ?-tilt (perpendicular to the holder's longitudinal axis). Positive tilt is clockwise.
unit: degree

TiltY
type: DatatypeProperty
domain: Instrument
range: double
description: Tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
unit: degree
relatedTechnique: TransmissionElectronMicroscopy

TiltYMax
type: DatatypeProperty
domain: Instrument
range: double
description: Maximum tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Maximum tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
unit: degree
relatedTechnique: TransmissionElectronMicroscopy

TiltYMin
type: DatatypeProperty
domain: Instrument
range: double
description: Minimum tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Minimum tilt of the TEM specimen holder about the ? axis (orthogonal to ? axis). Positive tilt is clockwise.
unit: degree
relatedTechnique: TransmissionElectronMicroscopy

studiedFor
type: DatatypeProperty
range: string
description: Description about what the documented object is studied for.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Description about what the documented object is studied for.

workingDistance
type: DatatypeProperty
domain: Instrument
range: double
description: Distance between the sample and the electron polepiece.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Distance between the sample and the electron polepiece.
unit: m
relatedTechnique: ScanningElectronMicroscopy

AluminiumElectropolishing
type: Class
description: Standard procedure for electropolishing of aluminium samples within the TEM Gemini Centre.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Standard procedure for electropolishing of aluminium samples within the TEM Gemini Centre.

ExtrudedAluminiumCuttingAndPolishing
type: Class
description: The standard cutting and polishing procedure within the TEM Gemini Centre for an extruded aluminium profile.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: The standard cutting and polishing procedure within the TEM Gemini Centre for an extruded aluminium profile.

High-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM)
type: Class
subclass of: TransmissionElectronMicroscopy
description: An atomic-resolution imaging technique that uses a specialized detector to capture high-angle, incoherent scattered electrons. This method creates images where the brightness of an atomic column is directly related to its atomic number (Z-contrast), allowing for the direct interpretation of atomic-scale chemical composition without needing complex simulations, unlike conventional bright-field imaging.
label: HAADFSTEM
alternative label: HAADF-STEM
alternative label: HighAngleAnnularDarkFieldScanningTransmissionElectronMicroscopy
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: An atomic-resolution imaging technique that uses a specialized detector to capture high-angle, incoherent scattered electrons. This method creates images where the brightness of an atomic column is directly related to its atomic number (Z-contrast), allowing for the direct interpretation of atomic-scale chemical composition without needing complex simulations, unlike conventional bright-field imaging.

Instrument
type: Class
subclass of: CharacterisationMeasurementInstrument
description: Device used for making measurements, alone or in conjunction with one or more supplementary devices.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Device used for making measurements, alone or in conjunction with one or more supplementary devices.

SPED
type: Class
subclass of: TransmissionElectronMicroscopy
description: A specialized method to collect electron diffraction patterns in a transmission electron microscope. By scanning over the sample and for each pixel rotating a tilted incident electron beam around the central axis of the microscope, a SPED pattern is formed by integration over a collection of diffraction conditions.
alternative label: ScanningPrecissionElectronDiffraction
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: A specialized method to collect electron diffraction patterns in a transmission electron microscope. By scanning over the sample and for each pixel rotating a tilted incident electron beam around the central axis of the microscope, a SPED pattern is formed by integration over a collection of diffraction conditions.

STEM
type: Class
subclass of: TransmissionElectronMicroscopy
description: An advanced imaging technique that generates high-resolution images of a sample's internal structure by scanning a focused electron beam across it and collecting transmitted signals. It provides nanoscale to atomic-level details and can acquire spectroscopic data like X-ray and electron energy loss spectra to analyze the composition of materials. STEM is similar to a conventional transmission electron microscope (TEM) in that the image is formed by electrons passing through a thin specimen, but differs in how the beam is used.
alternative label: ScanningTransmissionElectronMicroscopy
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: An advanced imaging technique that generates high-resolution images of a sample's internal structure by scanning a focused electron beam across it and collecting transmitted signals. It provides nanoscale to atomic-level details and can acquire spectroscopic data like X-ray and electron energy loss spectra to analyze the composition of materials. STEM is similar to a conventional transmission electron microscope (TEM) in that the image is formed by electrons passing through a thin specimen, but differs in how the beam is used.

SampleHolder
type: Class
subclass of: CharacterisationComponent
description: Holder for samples in a characterisation system.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Holder for samples in a characterisation system.

ScanningElectronMicroscope
type: Class
subclass of: CharacterisationSystem
subclass of: Instrument
description: A type of electron microscope that produces images of a sample by scanning the surface with a focused beam of electrons. The electrons interact with atoms in the sample, producing various signals that contain information about the surface topography and composition.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: A type of electron microscope that produces images of a sample by scanning the surface with a focused beam of electrons. The electrons interact with atoms in the sample, producing various signals that contain information about the surface topography and composition.

T8T9Aging1
type: Class
subclass of: T8T9TreatmentTask
subclass of: Restriction
  some values from: T8T9Deformation
subclass of: Restriction
  has value: t8t9aging1 duration
subclass of: Restriction
  has value: t8t9aging1 temp
description: First aging step of the T8T9 treatment.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: First aging step of the T8T9 treatment.

T8T9Aging2
type: Class
subclass of: T8T9TreatmentTask
subclass of: Restriction
  has value: t8t9aging2 duration
subclass of: Restriction
  has value: t8t9aging2 temp
description: Second aging step of the T8T9 treatment.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Second aging step of the T8T9 treatment.

T8T9Deformation
type: Class
subclass of: T8T9TreatmentTask
subclass of: Restriction
  some values from: T8T9Aging2
subclass of: Restriction
  has value: t8t9deformation strain
description: Deformation step of the T8T9 treatment.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Deformation step of the T8T9 treatment.

T8T9Treatment
type: Class
subclass of: Restriction
  some values from: T8T9Aging1
description: Thermomechanical treatment for T8 and T9 temper. Treatment steps: - 100°C @ 1h - 15% deformation - 150°C @ 2h
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: Thermomechanical treatment for T8 and T9 temper. Treatment steps: - 100°C @ 1h - 15% deformation - 150°C @ 2h

T8T9TreatmentTask
type: Class
description: The class of workflow tasks for the T8T9 treatment.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: The class of workflow tasks for the T8T9 treatment.

TransmissionElectronMicroscope
type: Class
subclass of: CharacterisationSystem
subclass of: Instrument
description: A high-resolution characterisation system that uses a beam of electrons transmitted through the sample. It provides detailed information about a sample's internal structure, morphology, and chemical composition down to the atomic level by detecting the electrons that pass through.
EMMO 967080e5 2f42 4eb2 a3a9 c58143e835f9: A high-resolution characterisation system that uses a beam of electrons transmitted through the sample. It provides detailed information about a sample's internal structure, morphology, and chemical composition down to the atomic level by detecting the electrons that pass through.

Jesper Friis
type: Person
alternative label: JesperFriis
workplace homepage: https://www.sintef.no/en

Tor Strømsem Haugland
type: Person
alternative label: TorHaugland
workplace homepage: https://www.sintef.no/en

Sigurd Wenner
type: Person
alternative label: SigurdWenner
workplace homepage: https://www.sintef.no/en

TEM Gemini Centre
type: NamedIndividual
type: Organization
alternative label: TEMGeminiCentre

t8t9aging1 duration
type: NamedIndividual
EMMO faf79f53 749d 40b2 807c d34244c192f4: 1h

t8t9aging1 temp
type: NamedIndividual
EMMO faf79f53 749d 40b2 807c d34244c192f4: 100°C

t8t9aging2 duration
type: NamedIndividual
EMMO faf79f53 749d 40b2 807c d34244c192f4: 2h

t8t9aging2 temp
type: NamedIndividual
EMMO faf79f53 749d 40b2 807c d34244c192f4: 150°C

t8t9deformation strain
type: NamedIndividual
EMMO faf79f53 749d 40b2 807c d34244c192f4: 15%

Inga D. Konow
type: Person
alternative label: IngaKonow
workplace homepage: https://www.ntnu.edu

Elisabeth Thronsen
type: NamedIndividual
type: Person
alternative label: ElisabethThronsen
workplace homepage: https://www.sintef.no/en